Wright Williams & Kelly
SIA Roadmap Identifies
Applications of Cost Modeling
December 2, 1997 (Dublin, CA) - The update to the National Technology Roadmap for Semiconductors (NTRS), to be released on Monday, December 8, 1997, has identified needed applications of cost modeling and simulation for the semiconductor industry over the next 15 years. The NTRS "Grand Challenges" identify the following applications:
Wright Williams & Kelly has identified these and other applications of cost modeling in a white paper, "NTRS Applications of Cost Modeling." The full text of this analysis will be available at http//:www.wwk.com on Monday, December 8, 1997.
- Affordable Scaling: "New materials, new technologies, and new approaches must be invented. Affordable scaling and these required inventions constitute the Grand Challenges."
- Affordable Lithography: "[Sub-100 nanometer lithography] will require more than simply developing an exposure tool... it will require a complete infrastructure of resists; masks; mask writing, inspection, and repair tools; and associated systems."
- Metrology and Test: "...it is not clear how the more complex chips of future generations will be tested. Affordable, sensitive, and accurate methods are required..."
- Research and Development: "The research and development needs and manufacturing costs for each technology area appear to increase as feature sizes decrease... Stand alone solutions may neither be affordable or manageable in the future."